A comparative study on a high aspect ratio contact hole etching in UFC- and PFC-containing plasmas > 논문현황

A comparative study on a high aspect ratio contact hole etching in UFC- and PFC-containing plasmas

논문명	A comparative study on a high aspect ratio contact hole etching in UFC- and PFC-containing plasmas
연도	2007
저널명	Microelectronics Journal
게재년월	2007.01.
게재 권/집	38
쪽수	125-129
저자	Hyun-Kyu Ryu, Yil-Wook Kim, Kangtaek Lee, CheeBurm Shin, and Chang-Koo Kim*