Single- and Multi-Directional Slanted Plasma Etching of Silicon under Practical Plasma Processing Co… 페이지 정보 19-06-28 13:31 본문 논문명 Single- and Multi-Directional Slanted Plasma Etching of Silicon under Practical Plasma Processing Conditions 연도 2014 저널명 ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY 게재년월 2014.09. 게재 권/집 3 쪽수 215-220 저자 Sung-Woon Cho, Jun-Hyun Kim, Doo Won Kang, Kangtaek Lee, Chang-Koo Kim* 이전 목록으로 다음
